雷射設備領導品牌,提供客戶全方位的解決方案

E&R keep focus on develop new equipment for Semiconductor by using leading technology in Laser and Plasma, providing higher quality, higher accuracy and higher flexibility products, co-work and customize different demands with user to fulfill dreams. 

E&R focus on Wafer level equipment with 3nm accuracy as target, investing more R&D resource to processing more high-tech future, also enhancing Substrate level equipment more fit to user need, more accurate marking accuracy, smaller layout and CIM solutions

E&R Plasma technology not only provide RF solution but also Microwave, both In-line, Batch Type, wafer form, also providing Plasma Service to customers

Welcome to contact us to learn more information, we are happy to fulfill your need



一直以來,E&R持續堅持用最嚴謹的態度,最專業的技術能力以及市場的雷射領導品牌開發半導體設備,提供給使用者最好的操作享受。

不管是在雷射加工處理,電漿技術能力發展,都朝著提供高品質,高精準度,高彈性的高度客製化能力最為最高標準,期許著提供每一位使用者”美夢成真”的權利。


近年來,E&R投入更多的研發能力,興建新廠房提供更適合製作高精度設備環境製造Wafer Level 晶圓等級的技術能力,同時也更精進在Substrate Level的設備,更好的throughput, 更高的打印精度,更小的體積以及更多的選配項目

E&R電漿技術不僅只提供傳統RF的解決方案,更增加了微波, In-line, 腔體式,以及晶圓等級的處理,也提供客戶更多研發的可能性。

我們歡迎您隨時與我們聯絡,了解更多資訊以及更多可能性! 


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E&R WB-300AG 8’12’ Inch Wafer Backside Marking Machine

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E&R DB-200 Dual Stage transferring Packing Marking Machine

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MW-600 Microwave Plasma Clean Machine